Symposium EN05—Emerging Materials for Electrochemical Energy Storage Devices—Degradation and Failure Characterization—From Composition, Structure and Interfaces to Deployed Systems
40 Years of Semiconductor Research Corporation

Symposium SF10—Emerging Functional Materials and Interfaces

Jayakanth Ravichandran, University of Southern California

Tracking the Surface Chemistry and Composition of Complex Oxides In Situ During Growth

Written by Mohit Saraf

Jayakanth Ravichandran talked about a new Auger electron spectroscopy method developed by his group that can monitor structure and composition of oxide surfaces during thin film growth. He said there are several in situ characterization methods available to probe the thin film growth; however, chemical and compositional analysis with reliable measurement in real time remain scarce. The developed method can be used along with reflection high energy electron diffraction (RHEED). His research group used the developed method and related techniques to establish stoichiometric growth of complex oxides with in situ control and first, direct observation of surface termination switching in complex oxides during the growth was recorded. Ravichandran also discussed computational analysis of superlattices, evolution of stoichiometry, termination switching, and he cited examples of chemical analysis and charge transfer in LaMnO3 and CaMnO3. He concluded that the developed method could perform compositional analysis in real time which is kind of a first effort on in situ chemical analysis. He believes that this method can be extended to several other oxides to understand the surface chemistry.


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